光学材料的表征(英文)
资料介绍
光学材料的表征(英文)
作者:(美)布伦德尔,(美)埃文斯,(美)伊莎霍斯 主编
出版时间:2014年
内容简介
Characterization in Optica/ Materia/s provides information for understanding the properties and performance of optical materials under the influence of the various characterization techniques. Surface and interfacial properties are key to the optical response of a material, and their control and modification during materials processing is necessary to achieve desired behavior. Characterization of Optica/ Materia/s focuses on how surface morphology, microstructure, and chemical bonding influence the optical response of a material, and it illuminates methods used to characterize thin films, multilayer structures, and modified surfaces,
目录
Preface to Series
Preface to the Reissue of Characterization of Optical Materials
Preface
Contributors
INTRODUCTION
PART 1 INFLUENCE OF SURFACEMORPHOLOGYAND
MICROSTRUCTURE ON OPTICAL RESPONSE
CHARACTERIZATION OF SURFACE ROUGHNESS
1.1 Introduction
1.2 WhatSurfaceRoughnessls
1.3 HowSurfaceRoughness AffctsOpticaIMeasurements
1.4 How Surface Roughness and ScatteringAre Measured
1.5 Characterization ofSelected Surfaces
1.6 Future Difections
CHARACTERIZATION OF THE NEAR-SURFACE REGION USING POIARIZATION-SENSITIVE OPTICAL TECHNIQUES
2.1 Introduction
2.2 Ellipsometry
ExperimentallmplementationsofEllipsometry 29, Analysisof
EllipsometryData
2.3 MicrostructuralDeterminationsfromEllipsometryData
Temperature Dependence ofthe Opticat Properties ofSilicon 34,
Determination ofthe Optical Functions ofGlasses Using SE 35,
SpectroscopicEllipsometryStudiesofSi02/Si 37, Spectroscopic
EllipsometryforComplicatedFilmStrucrures 38, Time-Resolved
Ellipsometry 40, Single-WavelengthReal-TimeMonitoringofFilm
Growth 41, Multiple-WavelengthReal-TimeMonitoringofFilm
Growth 42, Infrared EllipsometryStudies ofFilm Growth
THE COMPOSITION, STOICHIOMETRY, AND RELATED MICROSTRUCTURE OF OPTICAL MATERIALS
3.1 Introduction
3.2 AspectsofRamanScattering
3.3 III-VSemiconductor Systems
3.4 GroupIVMaterials
3.5 Amorphous and Microcrystalline Semiconductors
ChalcogenideGlasses 60, GroupIVMicrocrystallineSemiconductors
3.6 Summary
DIAMOND AS AN OPTICAL MATERIAL
4.1 Introduction
4.2 DepositionMethods
4.3 0pticalPropertiesofCVD Diamond
4.4 Defectsin CVD Diamond
4.5 PolishingCVD Diamond
4.6 X-rayWindow
4.7 Summary
PART 2 STABILITY AND MODIFICATION OF FILM AND SURFACE OPTICAL PROPERTIES
MULTIJAYER OPTICAL COATINGS
5.1 Introduction
5.2 Single-LayerOpticalCoatings
OpticaIConstants 90, CompositionMeasurementTechniques
5.3 MultilayerOpticalCoatings
CompositionaIAnalysis 107, SurfaceAnalyticaITechniques 108,
MicrostructuralAnalysis ofMultilayer Optical Coatings
5.4 StabilityofMultilayerOpticalCoatings
5.5 Future Compositional and
MicrostructuralAnalyticaITechniques
CHARACTERIZATION AND CONTROL OF STRESS IN OPTICAL FILMS
6.1 Introduction
6.2 0rigins ofStress
……
作者:(美)布伦德尔,(美)埃文斯,(美)伊莎霍斯 主编
出版时间:2014年
内容简介
Characterization in Optica/ Materia/s provides information for understanding the properties and performance of optical materials under the influence of the various characterization techniques. Surface and interfacial properties are key to the optical response of a material, and their control and modification during materials processing is necessary to achieve desired behavior. Characterization of Optica/ Materia/s focuses on how surface morphology, microstructure, and chemical bonding influence the optical response of a material, and it illuminates methods used to characterize thin films, multilayer structures, and modified surfaces,
目录
Preface to Series
Preface to the Reissue of Characterization of Optical Materials
Preface
Contributors
INTRODUCTION
PART 1 INFLUENCE OF SURFACEMORPHOLOGYAND
MICROSTRUCTURE ON OPTICAL RESPONSE
CHARACTERIZATION OF SURFACE ROUGHNESS
1.1 Introduction
1.2 WhatSurfaceRoughnessls
1.3 HowSurfaceRoughness AffctsOpticaIMeasurements
1.4 How Surface Roughness and ScatteringAre Measured
1.5 Characterization ofSelected Surfaces
1.6 Future Difections
CHARACTERIZATION OF THE NEAR-SURFACE REGION USING POIARIZATION-SENSITIVE OPTICAL TECHNIQUES
2.1 Introduction
2.2 Ellipsometry
ExperimentallmplementationsofEllipsometry 29, Analysisof
EllipsometryData
2.3 MicrostructuralDeterminationsfromEllipsometryData
Temperature Dependence ofthe Opticat Properties ofSilicon 34,
Determination ofthe Optical Functions ofGlasses Using SE 35,
SpectroscopicEllipsometryStudiesofSi02/Si 37, Spectroscopic
EllipsometryforComplicatedFilmStrucrures 38, Time-Resolved
Ellipsometry 40, Single-WavelengthReal-TimeMonitoringofFilm
Growth 41, Multiple-WavelengthReal-TimeMonitoringofFilm
Growth 42, Infrared EllipsometryStudies ofFilm Growth
THE COMPOSITION, STOICHIOMETRY, AND RELATED MICROSTRUCTURE OF OPTICAL MATERIALS
3.1 Introduction
3.2 AspectsofRamanScattering
3.3 III-VSemiconductor Systems
3.4 GroupIVMaterials
3.5 Amorphous and Microcrystalline Semiconductors
ChalcogenideGlasses 60, GroupIVMicrocrystallineSemiconductors
3.6 Summary
DIAMOND AS AN OPTICAL MATERIAL
4.1 Introduction
4.2 DepositionMethods
4.3 0pticalPropertiesofCVD Diamond
4.4 Defectsin CVD Diamond
4.5 PolishingCVD Diamond
4.6 X-rayWindow
4.7 Summary
PART 2 STABILITY AND MODIFICATION OF FILM AND SURFACE OPTICAL PROPERTIES
MULTIJAYER OPTICAL COATINGS
5.1 Introduction
5.2 Single-LayerOpticalCoatings
OpticaIConstants 90, CompositionMeasurementTechniques
5.3 MultilayerOpticalCoatings
CompositionaIAnalysis 107, SurfaceAnalyticaITechniques 108,
MicrostructuralAnalysis ofMultilayer Optical Coatings
5.4 StabilityofMultilayerOpticalCoatings
5.5 Future Compositional and
MicrostructuralAnalyticaITechniques
CHARACTERIZATION AND CONTROL OF STRESS IN OPTICAL FILMS
6.1 Introduction
6.2 0rigins ofStress
……
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